CONVERGENCE OF ITERATIVE SOLVERS FOR NON-LINEAR STEP-AND-FLASH IMPRINT LITHOGRAPHY SIMULATIONS

Maciej Paszyński

doi:10.7494/csci.2011.12.0.63

Authors

Maciej Paszyński AGH University of Science and Technology

DOI:

https://doi.org/10.7494/csci.2011.12.0.63

Keywords:

iterative solvers, non-linear problems, Step-and-Flash Imprint Lithography

Abstract

The paper presents the analysis of the iterative solvers utilized to solve the non-linear problemof Step-and-Flash Imprint Lithography (SFIL) a modern patterning process. The simulationsconsists in solving molecular statics problem for the polymer network, with quadratic potentials.The model distinguishes the strong interparticle interactions between particles forminga polymer network, and weak interactions between remaining particles. It also allows for largedeformations, which all together implies the non-linear model. To illustrate the convergenceof the iterative solvers, we present snapshots of the deformation of the sample being subjectto the iterative solution. We claim that the animation is an interesting way of illustratingthe convergence of the iterative solvers.

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Author Biography

Maciej Paszyński, AGH University of Science and Technology

Faculty of Electrical Engineering, Automatics, ITand Electronics, Department of Computer Science

References

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SLATEC Common Mathematical Library http://www.netlib.org/slatec