CONVERGENCE OF ITERATIVE SOLVERS FOR NON-LINEAR STEP-AND-FLASH IMPRINT LITHOGRAPHY SIMULATIONS

Authors

  • Maciej Paszyński AGH University of Science and Technology

DOI:

https://doi.org/10.7494/csci.2011.12.0.63

Keywords:

iterative solvers, non-linear problems, Step-and-Flash Imprint Lithography

Abstract

The paper presents the analysis of the iterative solvers utilized to solve the non-linear problemof Step-and-Flash Imprint Lithography (SFIL) a modern patterning process. The simulationsconsists in solving molecular statics problem for the polymer network, with quadratic potentials.The model distinguishes the strong interparticle interactions between particles forminga polymer network, and weak interactions between remaining particles. It also allows for largedeformations, which all together implies the non-linear model. To illustrate the convergenceof the iterative solvers, we present snapshots of the deformation of the sample being subjectto the iterative solution. We claim that the animation is an interesting way of illustratingthe convergence of the iterative solvers.

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Author Biography

Maciej Paszyński, AGH University of Science and Technology

Faculty of Electrical Engineering, Automatics, ITand Electronics, Department of Computer Science

References

Bailey T. C., Colburn M. E., Choi B. J., Grot A., Ekerdt J. G., Sreenivasan S. V., Willson C. G.: Step and Flash Imprint Lithography: A Low-Pressure, Room Temperature Nanoimprint Patterning Process’. Alternative Lithography. Unleashing the Potentials of Nanotechnology, C. Sotomayor Torres, Editor. Elsevier, 2002.

Burns R. L., Johnson, S. C., Schmid G. M., Kim E. K., Dickey M. D., Meiring J., Burns S. D., Stacey N. A., Willson C. G.: Mesoscale modeling for SFIL simulating polymerization kinetics and densification. Proc. of SPIE (International Society for Optics and Photonics), vol. 5374, 2004, pp. 348–360.

Colburn M., Suez I., Choi B. J., Meissl M., Bailey T., Sreenivasan S. V., Ekerdt J. G., Willson C. G.: Characterization and modeling of volumetric and mechanical properties for step and flash imprint lithography photopolymers. Journal of Vacuum Science and Technology B., vol. 19 issue 6, 2001, pp. 2685–2689.

Bailey T., Smith B., Choi B. J., Colburn M., Meissl M., Sreenivasan S. V., Ekerdt J. G., Willson C. G.: Step and flash imprint lithography: Defect analysis. Journal of Vacuum Science and Technology B., vol. 19 issue 6, 2001, p. 2806-2810.

Demkowicz L., Kurtz J., Pardo D., Paszynski M., Rachowicz W., Zdunek A.: Computing with hp-Adaptive Finite Element Method. Vol. II. Frontiers: Three Dimensional Elliptic and Maxwell Problems. Chapmann & Hall / CRC Applied Mathematics & Nonlinear Science, 2007.

Paszynski M., Romkes A., Collister E., Meiring J., Demkowicz L., Willson G. C.: On the Modeling of Step-and-Flash Imprint Lithography using Molecular Statics Models. ICES Report 05-38, The University of Texas in Austin, 2005.

SLATEC Common Mathematical Library http://www.netlib.org/slatec

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Published

2013-03-10

How to Cite

Paszyński, M. (2013). CONVERGENCE OF ITERATIVE SOLVERS FOR NON-LINEAR STEP-AND-FLASH IMPRINT LITHOGRAPHY SIMULATIONS. Computer Science, 12, 63. https://doi.org/10.7494/csci.2011.12.0.63

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